MRF1535NT1 MRF1535FNT1 MRF1535T1 MRF1535FT1

9

RF Device Data

Freescale Semiconductor

APPLICATIONS INFORMATION

DESIGN CONSIDERATIONS

This device is a common−source, RF power, N−Channel

enhancement mode, Lateral Metal−Oxide Semiconductor

Field−Effect Transistor (MOSFET). Freescale Application

Note AN211A, “FETs in Theory and Practice”, is suggested

reading for those not familiar with the construction and char-

acteristics of FETs.

This surface mount packaged device was designed pri-

marily for VHF and UHF mobile power amplifier applications.

Manufacturability is improved by utilizing the tape and reel

capability for fully automated pick and placement of parts.

However, care should be taken in the design process to in-

sure proper heat sinking of the device.

The major advantages of Lateral RF power MOSFETs in-

clude high gain, simple bias systems, relative immunity from

thermal runaway, and the ability to withstand severely mis-

matched loads without suffering damage.

MOSFET CAPACITANCES

The physical structure of a MOSFET results in capacitors

between all three terminals. The metal oxide gate structure

rication of the RF MOSFET results in a junction capacitance

tween the inter−terminal capacitances and those given on

two ways:

1. Drain shorted to source and positive voltage at the gate.

2. Positive voltage of the drain in respect to source and zero

volts at the gate.

In the latter case, the numbers are lower. However, neither

method represents the actual operating conditions in RF ap-

plications.

Drain

Source

Gate

DRAIN CHARACTERISTICS

One critical figure of merit for a FET is its static resistance

in the linear region of the output characteristic and is speci-

fied at a specific gate−source voltage and drain current. The

drain−source voltage under these conditions is termed

coefficient at high temperatures because it contributes to the

power dissipation within the device.

recommended and may result in possible damage to the de-

vice.

GATE CHARACTERISTICS

The gate of the RF MOSFET is a polysilicon material, and

is electrically isolated from the source by a layer of oxide.

— resulting in a leakage current of a few nanoamperes.

Gate control is achieved by applying a positive voltage to

the gate greater than the gate−to−source threshold voltage,

Gate Voltage Rating — Never exceed the gate voltage

damage to the oxide layer in the gate region.

Gate Termination — The gates of these devices are es-

sentially capacitors. Circuits that leave the gate open−cir-

cuited or floating should be avoided. These conditions can

result in turn−on of the devices due to voltage build−up on

the input capacitor due to leakage currents or pickup.

Gate Protection — These devices do not have an internal

monolithic zener diode from gate−to−source. If gate protec-

tion is required, an external zener diode is recommended.

Using a resistor to keep the gate−to−source impedance low

also helps dampen transients and serves another important

function. Voltage transients on the drain can be coupled to

the gate through the parasitic gate−drain capacitance. If the

gate−to−source impedance and the rate of voltage change

on the drain are both high, then the signal coupled to the gate

may be large enough to exceed the gate−threshold voltage

and turn the device on.

DC BIAS

Since this device is an enhancement mode FET, drain cur-

rent flows only when the gate is at a higher potential than the

source. RF power FETs operate optimally with a quiescent

suggested value of bias current for typical applications. For

have to be selected to optimize the critical parameters.

The gate is a dc open circuit and draws no current. There-

fore, the gate bias circuit may generally be just a simple re-

sistive divider network. Some special applications may

require a more elaborate bias system.

GAIN CONTROL

Power output of this device may be controlled to some de-

gree with a low power dc control signal applied to the gate,

thus facilitating applications such as manual gain control,

ALC/AGC and modulation systems. This characteristic is

very dependent on frequency and load line.